Things to consider as starting points:
What is the theoretical basis for the characterization technique, synthetic method and/or general theme?
What are the nuts and bolts of the method, e.g. for a characterization technique samples size, geometry, sample prep, etc?
What is the current state of the art regarding this topic?
For instruments: Who are the leading manufacturers in the field and what is the typical cost of the instrument?
For other topics: Who are the leading researchers in the field?
What are the limitations associated with the topic? Is there room for improvement?
Category: ACS
1.0 Introduction (200-250)
– what is optical lithography
– steps include spin coating of photoresists, soft bake, mask alignment, UV exposure, and development
– the relationship between feature resolution and wavelength of light
-do not include history
1.1 Technique of optical lithography (include one figure)
1.1.1 Contact lithography (150)
– what is contact lithography and the principles
1.1.2 Proximity lithography (150)
– what is proximity lithography and the principles
1.1.3 Projection lithography (150)
– what is projection lithography and the principles
1.2 Applications (150-200)
– general application
– what drives miniaturizationin chip fabrication.
